UV Quartz Glass Plate for Semiconductor Photomask Large Size High Temperature Resistant Fused Silica Sheet
Detalhes do produto
| Tipo: | Placa de quartzo limpa | Aplicativo: | Semicondutor, óptico |
|---|---|---|---|
| Grossura: | 0,5-100mm | Forma: | Quadrado |
| Serviço de processamento: | Punchando, corte | Nome do produto: | Placa de vidro de quartzo |
| Material: | SiO2 | SiO2: | SiO2> 99,99% |
| Densidade: | 2.2g/cm3 | Cor: | Claro transparente |
| Temperatura de trabalho: | 1100°C | Ponto de fusão: | 1732℃ |
| Porta: | Porto de Xangai e Qindao | ||
| Destacar |
UV quartz glass plate,large fused silica sheet,high temperature resistant photomask |
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Descrição do produto
Destaques do produto
High-purity (99.99% SiO₂) fused silica quartz glass plates engineered for semiconductor photomask and wafer manufacturing. These high-temperature-resistant, corrosion-resistant rectangular and square sheets are available in JGS1, JGS2, and JGS3 grades, with custom frosted plate options manufactured ...
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